Chang, Ha-Joon. <br/><br/>
Who benefits from the new international intellectual property rights regime? :  and what should Africa do? / 
Ha-Joon Chang. 
 - Nairobi :  African Technology Policy Studies Network,  2001 or 2 002. 
 - 14 p. ;  21 cm. 
 - ATPS technology brief ;   1 .
<br/><br/>Includes bibliographical references: (p. 14). 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Intellectual property-- Africa.
<br/><br/><label>Dewey Class. No.: </label>346.6048